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Title Plasma deposition of amorphous silicon-based materials / edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.
Imprint Boston : Academic Press, [1995]

Series Plasma--materials interactions
Plasma--materials interactions.
Subject Amorphous semiconductors -- Design and construction.
Silicon alloys.
Plasma-enhanced chemical vapor deposition.
Alt Name Bruno, Giovanni.
Capezzuto, Pio.
Madan, A. (Arun)
Description 1 online resource (xi, 324 pages) : illustrations.
polychrome rdacc
Bibliography Note Includes bibliographical references and index.
Contents Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices.
Summary Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.
Note Print version record.
ISBN 9780080539102 (electronic bk.)
0080539106 (electronic bk.)
OCLC # 175286921
Additional Format Print version: Plasma deposition of amorphous silicon-based materials. Boston : Academic Press, ©1995 012137940X 9780121379407 (DLC) 95012433 (OCoLC)32311752

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